Instrumentation

The consortium approach allows SuperSTEM to provide access to cutting-edge aberration corrected instruments at the following locations (select to show):

SuperSTEM Site

Microscopes


SuperSTEM 1


                    


VG HB501 with MarkII Nion C
corrector

  • C3 Nion QO corrector for sub-1.0Å probes with 80pA current
  • 40-100kV cold FEG emitter with 0.3eV energy spread
  • BF/MAADF/HAADF detectors: 0-6/35-100/70-210mrad collection angles
  • UHF Enfina spectrometer with multipole coupling up to 19mrad EELS collection
  • Ex-situ gas reaction cell


SuperSTEM 2


                    


Nion UltraSTEM
TM 100


  • C5 Nion QO corrector, full correction up to six-fold astigmatism C5,6
  • 40-100kV cold FEG emitter with 0.3eV energy spread 
  • Flexible post-specimen optics for large EELS collection angles and flexible imaging detector setup
  • Ultrastable x, y, z sample stage with multi-holder in-vacuum magazine for convenient loading
  • ±35° tilt angle in 2 dimensions 
  • UHV Enfina EELS spectrometer
  • Bruker SSD EDS detector




SuperSTEM 3                                                                  Nion UltraSTEMTM 100MC 'HERMES'      

  •  Newly-developed C5 Nion QO corrector, with direct correction up to C5,6 for high spatial resolution (< 0.7 A at 100kV)
  • 40-100kV cold FEG emitter with 0.3eV native energy spread 
  • High-energy-resolution monochromator for ultimate 15meV energy resolution and built-in Cc corrector
  • Flexible post-specimen optics for large EELS collection angles and flexible imaging detector setup (BF/ABF/ADF)
  • Ultrastable x, y, z sample stage with multi-holder in-vacuum magazine for convenient loading and electrical contacting capabilities for custom in situ experiment design
  • UHV Gatan Enfinium ERS spectrometer, including fast shutter and dual EELS capabilities 




Sample Finishing

  • Gatan PIPS Model 1 ion polisher
  • Gatan DuoMill 600 ion polisher
  • Fischione Model 1020 plasma cleaner
  • Emitech K950X carbon coater/evaporator with film thickness monitor for depositing material and carbon coating samples prone to charging
  • Cemm CoatMaster for masking regions of interest during carbon coating
  • Fumehood with common laboratory solvents

SuperSTEM Computer Laboratory

A number of full user workstations with dedicated microscopy software are available for users. These include:          
  • Gatan Digital Micrograph
  • HREM Research plugins for Digital Micrograph, including PPA, qHAADF, MSA, GPA and 
    DeconvHAADF. These plugins are part of HREM Research Affiliate Site Program. 
  • Burker Esprit Software
  • Crystal Maker software, including Single Crystal
  • Wien2K
  • FEFF 9